In all application industries, the semiconductor industry has the most stringent requirements on the quality of sputtered films. Today, 12 inch (300 inch) silicon wafer has been manufactured, and the width of interconnection lines is decreasing. The requirements of silicon wafer manufacturers are large size, high purity, low segregation and fine grain, which requires the manufactured target to have better microstructure.

Step 2 show it

Flat panel display (FPD) has greatly impacted the computer display and TV market dominated by cathode ray tube (CRT) in recent years, and will also drive the technology and market demand of ITO target. At present, there are two kinds of iTO targets. One is to mix indium oxide and tin oxide powder in nanometer state and then sinter, and the other is to use indium-tin alloy target.

3. Used for storage

In terms of storage technology, the development of high-density and large-capacity hard disks requires a large number of giant magnetoresistance thin film materials. CoF~Cu multilayer composite film is a widely used giant magnetoresistance film structure. TbFeCo alloy target for magneto-optical disk is still developing, and the magneto-optical disk made of it has the characteristics of large storage capacity, long life and repeated non-contact erasure.

Extended data:

Development of target materials;

Various types of sputtered thin film materials have been widely used for surface coating of semiconductor integrated circuits (VLSI), optical disks, flat panel displays and workpieces. Since 1990s, the synchronous development of sputtering target and sputtering technology has greatly met the needs of the development of various new electronic components.

For example, in the manufacturing process of semiconductor integrated circuits, copper conductor films with low resistivity are used instead of aluminum films. In the flat panel display industry, various display technologies (such as LCD, PDP, organic light emitting diode and FED) have developed at the same time, and some of them have been used in the manufacture of computers and computer monitors.

In the information storage industry, the storage capacity of magnetic memory is constantly increasing, and new magneto-optical recording materials are constantly introduced, which put forward higher and higher requirements for the quality of sputtering targets, and the demand is also increasing year by year.

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